Home Faculty Electronics Group Fang-Hsing Wang Professor
Fang-Hsing WangProfessor - Electronics Group
Tel
+886-4-22840688 ext.706
E-Mail
Lab
Education
Ph.D. in Electronics Engineering, NCTU
Experiences
Professor, Department of Electrical Engineering & Graduate Institute of Optoelectronics, National Chung Hsing University, Feb. 2017-present
Associate Professor, Department of Electrical Engineering & Graduate Institute of Optoelectronics, National Chung Hsing University, Aug. 2011 - Jan. 2017
Assistant Professor, Department of Electrical Engineering, National Chung Hsing University, Aug. 2003 - July 2011
IEEE member,
Principal Engineer, Novatek Microelectronics Corp.,
Assistant Professor, Department of Electronics Engineering, Chienkuo Technology University,
Senior Engineer, AU Optronics Corp.,
Associate Professor, Department of Electrical Engineering & Graduate Institute of Optoelectronics, National Chung Hsing University, Aug. 2011 - Jan. 2017
Assistant Professor, Department of Electrical Engineering, National Chung Hsing University, Aug. 2003 - July 2011
IEEE member,
Principal Engineer, Novatek Microelectronics Corp.,
Assistant Professor, Department of Electronics Engineering, Chienkuo Technology University,
Senior Engineer, AU Optronics Corp.,
Research Areas
VLSI Process Technology
Integrated Circuits Design
Flat Panel Display Technology
Si Thin-film Solar Cell/Transparent Conducting Oxide Film Technology
One-dimensional nanomaterial/photodetector/Gas sensor
Integrated Circuits Design
Flat Panel Display Technology
Si Thin-film Solar Cell/Transparent Conducting Oxide Film Technology
One-dimensional nanomaterial/photodetector/Gas sensor
Academic Service
Awards
Selected Publications
● Journal Paper
1.
F.H. Wang, “2020~後之著作請詳見個人網頁(https://reurl.cc/E4nbLg),” Journal, pp. 1, https://sites.google.com/email.nchu.edu.tw/fansen-wang/%E8%AB%96%E6%96%87%E8%88%87%E8%91%97%E4%BD%9C, 01 2020.
2.
3.
Ching-Tian Chou and Fang-Hsing Wang*, “Fabrication and characterization of transparent conducting reduced graphene oxide/Ag nanowires/ZnO:Ga composite thin films on flexible substrates,” Journal of Vacuum Science and Technology A, vol. 5, no. 36, pp. 05G504, 09 2018. (EI、SCI)
4.
5.
6.
7.
8.
9.
10.
11.
12.
Fang-Hsing Wang*, Yen-Hsien Lee, Tsung-Kuei Kang, Han-Wen Liu, “Influence of RF power on physical properties of ZnO:ZnF2 thin films by RF magnetron sputtering,” Superlattices and Microstructures, no. 83, pp. 289-298, 03 2015. (EI、SCI)
13.
J. D. Hwang*, F. H. Wang, C. Y. Kung, and M. C. Chan, “Using the Surface Plasmon Resonance of Au Nanoparticles to Enhance Ultraviolet Response of ZnO Nanorods-Based Schottky-Barrier Photodetectors,” IEEE Trans. on Nanotechnology, vol. 2, no. 14, pp. 318-321, 03 2015. (EI、SCI)
14.
15.
16.
Fang-Hsing Wang*, Hung-Peng Chang, Jui-Yao Wu, Han-Wen Liu, “Comparative Study on Physical Properties of ZnO:Al Thin Films by in situ Hydrogen Doping and Hydrogen Plasma Post-treatment,” Journal of Engineering (National Chung Hsing University), vol. 3, no. 25, pp. 95-106, 12 2014.
17.
J. D. Hwang*, F. H. Wang, C. Y. Kung, M. J. Lai, and M. C. Chan, “Annealing effects of Au nanoparticles on the surface-plasmon enhanced p-Si/n-ZnO nanorods heterojunction photodetectors,” Journal of Applied Physics, no. 115, pp. 173110, 05 2014. (EI、SCI)
18.
11Fang-Hsing Wang, Shang-Chao Hung, Cheng-Fu Yang*, and Yen-Hsien Lee, “Effects of Hydrogen Plasma on the Electrical Properties of F-Doped ZnO Thin Films and p-i-n ??-Si:H Thin Film Solar Cells,” International Journal of Photoenergy,, no. 2014, pp. 425057, 05 2014. (EI、SCI)
19.
20.
Fang-Hsing Wang, Cheng-Fu Yang, Jian-Chiun Liou, In-Ching Chen, “Effects of Hydrogen on the Optical and Electrical Characteristics of the Sputter-Deposited Al2O3-doped ZnO Thin Films,” Journal of Nanomaterials, no. 2014, pp. 857614, 03 2014. (EI、SCI)
21.
22.
Fang-Hsing Wang, Hsin-Hui Kuo, Cheng-Fu Yang and Min-Chu Liu, “ Role of SiNx Barrier Layer on the Performances of Polyimide Ga2O3-doped ZnO p-i-n Hydrogenated Amorphous Silicon Thin Film Solar Cells,” Materials, vol. 2, no. 7, pp. 948-962, 02 2014. (EI、SCI)
23.
Chia-Cheng Huang, Fang-Hsing Wang, Cheng-Fu Yang, “Influences of Deposition Power of GZO Thin Films on the Properties of the Heterojunction Diode Based on a NiO/GZO Bi-layer Structure,” International Journal of Nanotechnology, vol. 1-4, no. 11, pp. 287-297, 01 2014. (EI、SCI)
24.
Fang-Hsing Wang, Hua-Tz Tzeng and Chia-Cheng Huang, “Effects of Deposition Temperature on the Properties of Ga-Doped ZnO Thin Films,” Journal of Science and Innovation, vol. 1, no. 4, pp. 7-12, 01 2014.
25.
Fang-Hsing Wang, Cheng-Fu Yang, Min-Chu Liu, “Using Flexible Polyimide as a Substrate to Deposit ZnO:Ga Thin Films and Fabricate p-i-n 𝛼-Si:H Thin-Film Solar Cells,” International Journal of Photoenergy, no. 2013, 10 2013. (EI、SCI)
26.
C.G. Kuo, C.L. Li, C.C. Huang, F.H. Wang, C.F. Yang*, I.C. Chen, “Effects of H2 Flow Rate and H2 Plasma Treatment on the Properties of AZO Films,” Advanced Materials Research, no. 813, pp. 447-451, 09 2013. (EI)
27.
Chia-Feng Lin, Ming-Shiou Lin, Chi-Chi Chen, Peng-Han Tsai, Fang-Hsing Wang, “Characterization of the well-aligned ZnO nanorod structure on a pulsed laser deposited AlZnO seed layer,” Surface & Coatings Technology, no. 231, 09 2013. (EI、SCI)
28.
Chia-Cheng Huang, Fang-Hsing Wang, Chia-Ching Wu, Hong-Hsin Huang and Cheng-Fu Yang, “Developing High Transmittance Heterojunction Diodes based on NiO/TZO Bi-Layer Thin Films,” Nanoscale Research Letters, 06 2013. (EI、SCI)
29.
30.
31.
C.C. Huang, F.H. Wang, Y.C. Chen, G.J. Chen, C.J. Huang, and C.F. Yang, “Investigating the Properties of ZnO-Al2O3-Y2O3 Transparent Conductive Metal Oxide Thin Films Prepared by E-beam PVD,” Advanced Science Letters, 02 2013. (EI、SCI)
32.
Fang-Hsing Wang, Chia-Cheng Huang, Chien-Chen Diao, Chia-Ching Wu, Cheng-Fu Yang, “Effects of Deposition Temperature and Hydrogen Plasma on the Properties of the Radio-Frequency Magnetron Sputtering Deposition of ZnO-Al2O3 Films,” Lecture Notes in Electrical Engineering, no. 234, pp. 783-791, 01 2013. (EI)
33.
34.
35.
Fang-Hsing Wang, Chia-Cheng Huang, Cheng-Fu Yang, “Effects of deposition temperature and hydrogen flow rate on the properties of Al-doped ZnO thin films and amorphous silicon thin-film solar cells,” Applied Physics A, 01 2013. (EI、SCI)
36.
Chia-Feng Lin, Ming-Shiou Lin, Chi-Chi Chen, Peng-Han Tsai, Fang-Hsing Wang, “Characterization of the well-aligned ZnO nanorod structure on a pulsed laser deposited AlZnO seed layer,” Surface & Coatings Technology, 12 2012. (EI、SCI)
37.
Tsung-Kuei Kang, Ta-Chuan Liao, Han-Wen Liu, Fang-Hsing Wang, Wen-Fa Wu, “Effects of different tunnel layers on retention characteristics for Pd-nanocrystal-based nonvolatile memory,” Microelectronic Engineering, vol. -, no. 95, 01 2012. (EI、SCI)
38.
39.
40.
41.
42.
43.
44.
45.
46.
H.W. Liu, S.M. Chiou, H.C. Ho, F.H. Wang, “Degradation of n-channel low temperature poly-Si TFTs dynamically stressed in OFF region with positive drain bias,” Microelectronic Engineering, vol. -, no. -, 01 2011. (EI、SCI)
47.
Tsung-Kuei Kang*, Han-Wen Liu, Fang-Hsing Wang, Cheng-Li Lin, Ta-Chuan Liao, Wen-Fa Wu, “Improved characteristics for Pd nanocrystal memory with stacked HfAlO–SiO2 tunnel layer,” Solid-State Electronics, vol. 1, no. 61, 01 2011. (EI、SCI)
48.
49.
50.
51.
52.
53.
54.
55.
56.
57.
58.
H. C. Cheng, C. Y. Huang, F. S. Wang, K. H. Lin, and F. G. Tarntair, “Thin-Film Transistors with Polycrystalline Silicon Films Prepared by Two-Step Rapid Thermal Annealing,” Jpn. J. Appl. Phys., vol. 1A/B, L19-L21, no. 39, 01 2000. (EI、SCI)
59.
H. C. Cheng, F. S. Wang and C. Y. Huang, “Effects of NH3 plasma passivation on n-channel polycrystalline silicon thin-film transistors,” IEEE Trans. Electron Devices., vol. 1, no. 44, pp. 64-68, 1997. (EI、SCI)
60.
F. S. Wang, C. Y. Huang and H. C. Cheng, “Plasma passivation effects on polycrystalline silicon thin-film transistors utilizing nitrous oxide plasma,” Jpn. J. Appl. Phys., vol. 4A, no. 36, 1997. (EI、SCI)
61.
F. S. Wang, M. J. Tsai, W. K. Lai, and H. C. Cheng, “Investigation of dosage effect on the activation of arsenic- and boron-implanted LPCVD amorphous-silicon films,” Appl. Surface Science, no. 92, pp. 372-377, 01 1996. (EI、SCI)
62.
F. S. Wang, M. J. Tsai, and H. C. Cheng, “The effects of NH3 plasma passivation on polysilicon thin film transistors,” IEEE Electron Device Lett, vol. 11, no. 16, pp. 503-505, 01 1995. (EI、SCI)
● Conference Paper
1.
Fang-Hsing Wang, Ching-Shan Wang, Han-Wen Liu, “Hydrothermally Grown ZnO Nanoflowers on a Template Assisted Ordered Seed Array,” International Conference on Advanced Technology Innovation 2019 (ICATI2019), 06 2019. Sapporo, Hokkaido, Japan,
2.
F H Wang*, H S Jhuang, H W Liu and T K Kang, “Radio frequency sputter deposition of Ga and F co-doped ZnO thin films: Effects of substrate temperature,” 4th Annual International Workshop on Materials Science and Engineering, 05 2018. Xi'an, China,
3.
Fang-Hsing Wang, He-Syun Jhuang, and Han-Wen Liu, “Post annealing temperature effect on properties of Ga and F codoped ZnO thin films prepared by RF magnetron sputtering,” THE TWENTY-FOURTH INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES, 07 2017. Kyoto, Japan,
4.
Chun-Chi Lin, Fang-Hsing Wang*, and Mao Shan Chen, “Effect of hydrogen doping on the properties of Al, F co-doped ZnO films for thin film silicon solar cells applications,” The 9th International Workshop on Zinc Oxide and Related Materials (IWZnO 2016), 10 2016. Sendai, Japan,
5.
Fang-Hsing Wang* and Chih-En Tsai, “Structural and Gas Sensing Characteristics of ZnO Nanorods Grown on Different Substrates,” 16th International Conference on Nanotechnology (IEEE NANO 2016), 08 2016. Sendai, Japan,
6.
Fang-Hsing Wang*, Chiao-Lu Chang, “Transparent conducting Al and F co-doped ZnO thin films prepared by rf magnetron sputtering,” The 13th International symposium on Sputtering & Plasma Processes (ISSP 2015), 07 2015. Kyoto, Japan,
7.
Fang-Hsing Wang, Ching-Shan Wang and Jhih-Yuan Lin, “Fabrication of ZnO Nanorod Arrays by Lift-off Technique on Sapphire Substrates,” Optics & Photonics Taiwan, International Conference (OPTIC 2014), 12 2014. Taichung, Taiwan,
8.
Fang-Hsing Wang, Jing-Tian Jou, Wei-Chun Chen, “Influences of concentration of reduce graphene oxide on properties of sol-gel prepared Al-doped Zinc oxide thin film,” The 7th International Conference on Technological Advances of Thin Films & Surface Coatings (ThinFilms2014), 07 2014. Chongqing, China,
9.
Tung-Hsin Yang, Fang-Hsing Wang*, Chun-Chi Lin, Yen-Lin Chiu, “Characterization of Al-F co-doped ZnO:H thin films by magnetron sputtering,” Optics & Photonics Taiwan, International Conference, OPTIC 2013, 12 2013. Chung-li, Taiwan,
10.
Fang-Hsing Wang, Hua-Tz Tzeng, Chia-Cheng Huang, and Miao-Chi Shih, “Effects of Thickness on the Properties of ZnO:Ga Thin Films by RF Magnetron Sputtering,” Optics & Photonics Taiwan, International Conference 2012 (OPTIC 2012), 12 2012. Taipei, Taiwan,
11.
F. H. Wang*, C. J. Lai, P. S. Shih, and P. C. Lin, “Cyclic Digital-to-Analog Converter with Double Conversion Rate and Capacitor Swapping Scheme,” International Display Manufacturing Conference (IDMC) 2011, 04 2011. Taipei, Taiwan,
12.
F. H. Wang, H. P. Chang, H. W. Liu, “Effects of Post-treatments on Characterization of Aluminum-doped zinc oxide thin films for amorphous crystalline silicon thin film solar cells,” The International Conference on Technological Advances of Thin Films & Surface Coatings 2011, 07 2010. Harbin, China,
13.
F. H. Wang, H. C. Lin, P. S. Shih, L. Y. Lin, H. W. Liu, “New Current Programmed Pixel Circuit for Active-Matrix Organic Light-Emitting-Diode Displays,” IDMC/3DSA/Asia Display Conference, 04 2009. Taipei, Taiwan,
14.
H. P. Chang, F. H. Wang, Y. C. Chen, J. Y. Wu, and H. W. Liu, “Effects of RF sputtered Al-doped ZnO films by Hydrogen process gas dilution,” 2008 International Electron Devices and Material Symposia (IEDMS), 11 2008. Taichung, Taiwan,
15.
16.
Han-Wen Liu, Jiun-Yan Tsai, Wei Lai, Si-Ming Chiou and Fang-Hsing Wang, “Instability of a-Si:H TFTs Under Asychronous AC Bias Stress,” 2008 Int. Electron Devices and Material Symposia (IEDMS ‘08), 11 2008. Taichung, Taiwan,
17.
Han-Wan Liu, Jie-Sung Lin, Zhi-Yuan Wang, Si-Ming Chiou and Fang-Hsing Wang, “Turn-around Phenomenon of the Poly-Si Thin Film Transistor’s Degradation under DC Bias Stress,” 2008 Int. Electron Devices and Material Symposia (IEDMS ‘08), 11 2008. Taichung, Taiwan,
18.
F. H. Wang, Z. J. Lin, and S. D. Tzeng, “Fabrication of Carbon Nanotube Field Emission Cathode by Composite Plating,” The 4th Int. Conf. on Technological Advances of Thin Films & Surface Coatings (ThinFilms2008), 07 2008. Singapore,
19.
20.
Fang-Hsing Wang and Chih-Ying Lin, “A Novel Complementary Mirror Type Analog Buffer for LTPS TFT-LCD Data Drivers,” Asia Display 2007 International Conference, 05 2007. Shanghai, China,
21.
Fang-Hsing Wang, Chih-Ying Lin, “A Novel Complementary Mirror Type Analog Buffer for LTPS TFT-LCD Data Drivers,” Asia Display 2007 International Conference, 05 2007. Shanghai, China,
22.
23.
24.
25.
26.
Fang-Hsing Wang and Tung-Hsuan Hsu, “A High Slew Rate and Low Offset Voltage Buffer for TFT-LCD Source Driver,” Society of Information Display, 06 2006. (EI、SCI)SanFrancisco, CA, USA, 2006,
27.
M. Q. Wang and F. H. Wang, “A Novel Reference Voltage Adjustment Circuits for Liquid Crystal Displays,” 15th VLSI/CAD Symposium, 08 2004. Ken-Ting, Taiwan, Aug. 10-13,
28.
F. S. Wang, C. Y. Huang, and H. C. Cheng, “Plasma passivation effects on polycrystalline silicon thin-film transistors using NH3 and N2O,” International Electron Device and Material Symposium,(IEDMS 96’), 12 1996. National Tsing Hua University, Hsinchu, Taiwan, R.O.C., Dec. 16-20, 1996,
29.
F. S. Wang, C. Y. Huang, and H. C. Cheng, “Novel N2O plasma passivation on polycrystalline silicon thin-film transistors,” Material Research Society (MRS 96’), 04 1996. (EI)San Francisco, California, U.S.A., Apr. 7-12, 1996,